Invention Grant
- Patent Title: Apparatus for the removal of a metal oxide from a substrate and methods therefor
- Patent Title (中): 用于从衬底去除金属氧化物的设备及其方法
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Application No.: US11237457Application Date: 2005-09-27
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Publication No.: US07662253B2Publication Date: 2010-02-16
- Inventor: Hyungsuk Alexander Yoon , William Thie , Yezdi Dordi , Andrew D. Bailey, III
- Applicant: Hyungsuk Alexander Yoon , William Thie , Yezdi Dordi , Andrew D. Bailey, III
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: IP Strategy Group, P.C.
- Main IPC: C23F1/00
- IPC: C23F1/00 ; H01L21/306 ; C23C16/00

Abstract:
An apparatus generating a plasma for removing metal oxide from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the metal oxide.
Public/Granted literature
- US20070072432A1 Apparatus for the removal of a metal oxide from a substrate and methods therefor Public/Granted day:2007-03-29
Information query