Invention Grant
- Patent Title: Pattern formation method
- Patent Title (中): 图案形成方法
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Application No.: US11964272Application Date: 2007-12-26
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Publication No.: US07662432B2Publication Date: 2010-02-16
- Inventor: Katsumi Suzuki
- Applicant: Katsumi Suzuki
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Global IP Counselors, LLP
- Priority: JP2007-008844 20070118
- Main IPC: B05D5/06
- IPC: B05D5/06 ; B05D5/12
Abstract:
A pattern formation method includes forming a plurality of concave parts adjacent to each other on a substrate, and discharging droplets including a functional liquid material on the substrate to form a prescribed pattern of the functional liquid material that straddles over the concave parts on the substrate.
Public/Granted literature
- US20080175981A1 PATTERN FORMATION METHOD Public/Granted day:2008-07-24
Information query
