Invention Grant
- Patent Title: Method of manufacturing nano-template for a high-density patterned medium and high-density magnetic storage medium using the same
- Patent Title (中): 制造高密度图案化介质的纳米模板和使用其的高密度磁存储介质的方法
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Application No.: US11781391Application Date: 2007-07-23
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Publication No.: US07662491B2Publication Date: 2010-02-16
- Inventor: Hae Sung Kim , Myung Bok Lee , Jin Seung Sohn
- Applicant: Hae Sung Kim , Myung Bok Lee , Jin Seung Sohn
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2006-0084203 20060901
- Main IPC: G11B5/66
- IPC: G11B5/66
Abstract:
Disclosed is a method for manufacturing a template for a high-density patterned medium and a high-density magnetic storage medium using the same. In the method, magnetic particles are used as a mask and no lithographic process is required.
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