Invention Grant
US07662540B2 Pattern forming material, pattern forming apparatus and pattern forming process 有权
图案形成材料,图案形成装置和图案形成工艺

Pattern forming material, pattern forming apparatus and pattern forming process
Abstract:
The present invention aims to provide a pattern forming material that is capable of suppressing generation of wrinkles and static electric charge on a substrate in a lamination step in which the pattern forming material is laminated on the substrate as well as capable of forming a fine and precise pattern; a pattern forming apparatus provided with the pattern forming material; and a pattern forming process using the pattern forming material.To this end, the present invention provides a pattern forming material having a support, a photosensitive layer, and a protective film, the photosensitive layer and the protective film being formed in this order on the support, wherein the number of fish-eyes each having an area of 2,000μm2 or more and a maximum height measured from the film surface of 1μm to 7μm residing in the protective film is 50/m2 to 1,000/m2.
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