Invention Grant
US07662540B2 Pattern forming material, pattern forming apparatus and pattern forming process
有权
图案形成材料,图案形成装置和图案形成工艺
- Patent Title: Pattern forming material, pattern forming apparatus and pattern forming process
- Patent Title (中): 图案形成材料,图案形成装置和图案形成工艺
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Application No.: US11661855Application Date: 2005-09-05
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Publication No.: US07662540B2Publication Date: 2010-02-16
- Inventor: Masanobu Takashima , Shinichiro Serizawa
- Applicant: Masanobu Takashima , Shinichiro Serizawa
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2004-258877 20040906
- International Application: PCT/JP2005/016264 WO 20050905
- International Announcement: WO2006/028060 WO 20060316
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004

Abstract:
The present invention aims to provide a pattern forming material that is capable of suppressing generation of wrinkles and static electric charge on a substrate in a lamination step in which the pattern forming material is laminated on the substrate as well as capable of forming a fine and precise pattern; a pattern forming apparatus provided with the pattern forming material; and a pattern forming process using the pattern forming material.To this end, the present invention provides a pattern forming material having a support, a photosensitive layer, and a protective film, the photosensitive layer and the protective film being formed in this order on the support, wherein the number of fish-eyes each having an area of 2,000μm2 or more and a maximum height measured from the film surface of 1μm to 7μm residing in the protective film is 50/m2 to 1,000/m2.
Public/Granted literature
- US20080088813A1 Pattern Forming Material, Pattern Forming Apparatus and Pattern Forming Process Public/Granted day:2008-04-17
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