Invention Grant
US07662669B2 Method of exposing circuit lateral interconnect contacts by wafer saw
有权
通过晶片锯暴露电路横向互连触点的方法
- Patent Title: Method of exposing circuit lateral interconnect contacts by wafer saw
- Patent Title (中): 通过晶片锯暴露电路横向互连触点的方法
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Application No.: US11782488Application Date: 2007-07-24
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Publication No.: US07662669B2Publication Date: 2010-02-16
- Inventor: Patty Pei-Ling Chang-Chien , Kelly Jill Tornquist Hennig , Ken Wai-Kin Ho , Ann Kent-Ming Ho
- Applicant: Patty Pei-Ling Chang-Chien , Kelly Jill Tornquist Hennig , Ken Wai-Kin Ho , Ann Kent-Ming Ho
- Applicant Address: US CA Los Angeles
- Assignee: Northrop Grumman Space & Mission Systems Corp.
- Current Assignee: Northrop Grumman Space & Mission Systems Corp.
- Current Assignee Address: US CA Los Angeles
- Agency: Miller IP Group. PLC
- Agent John A. Miller
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for fabricating wafer-level packages including lateral interconnects. The method includes precutting a cover wafer at the locations where the cover wafer will be completely cut through to separate the wafer-level packages. The cover wafer is bonded to the substrate wafer using bonding rings so as to seal the integrated circuit within a cavity between the cover wafer and the substrate wafer, where the precuts face the substrate wafer. The cover wafer is then cut at the precut locations to remove the unwanted portions of the cover wafer between the packages and expose contacts or probe pads for the lateral interconnects. The substrate wafer is then cut between the wafer-level packages to separate the packages.
Public/Granted literature
- US20090029526A1 Method of Exposing Circuit Lateral Interconnect Contacts by Wafer Saw Public/Granted day:2009-01-29
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