Invention Grant
- Patent Title: Optical device wafer dividing method
- Patent Title (中): 光器件晶圆分割方法
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Application No.: US12468411Application Date: 2009-05-19
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Publication No.: US07662700B2Publication Date: 2010-02-16
- Inventor: Hitoshi Hoshino , Takashi Yamaguchi
- Applicant: Hitoshi Hoshino , Takashi Yamaguchi
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer, Burns & Crain, Ltd.
- Priority: JP2008-154939 20080613
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An optical device wafer dividing method includes a rear surface grinding step for grinding a rear surface of the optical device wafer; a dicing tape sticking step for sticking the front surface of the optical device wafer bonded with the reinforcing substrate to the front surface of a dicing tape; a laser processing step for emitting a laser beam along the streets formed on the optical device wafer from the rear surface of the reinforcing substrate to perform laser processing on the reinforcing substrate along the streets to form fracture starting points; and a wafer dividing step for applying an external force along the fracture starting points of the reinforcing substrate to fracture the reinforcing substrate along the fracture starting points to fracture the optical device wafer along the streets.
Public/Granted literature
- US20090311848A1 OPTICAL DEVICE WAFER DIVIDING METHOD Public/Granted day:2009-12-17
Information query
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