Invention Grant
- Patent Title: Electro-optical device, method of manufacturing the same, electronic apparatus, and semiconductor device
- Patent Title (中): 电光装置及其制造方法,电子设备及半导体装置
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Application No.: US11539466Application Date: 2006-10-06
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Publication No.: US07662704B2Publication Date: 2010-02-16
- Inventor: Masahiro Yasukawa
- Applicant: Masahiro Yasukawa
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-294429 20051007
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/36 ; H01L29/10 ; H01L29/76 ; H01L31/112 ; H01L27/108 ; H01L29/00

Abstract:
An electro-optical device includes: a substrate; a plurality of pixel units provided in a display region on the substrate; and a driving circuit that is provided in a peripheral region surrounding the display region and includes semiconductor elements that drive the plurality of pixel units, each of the semiconductor elements having a first semiconductor layer and a second semiconductor layer. The first semiconductor layer has an SOI (silicon on insulator) structure including a first single crystal silicon layer, and the second semiconductor layer is formed of a second single crystal silicon layer that is formed on the first semiconductor layer by epitaxial growth.
Public/Granted literature
- US20070087534A1 ELECTRO-OPTICAL DEVICE, METHOD OF MANUFACTURING THE SAME, ELECTRONIC APPARATUS, AND SEMICONDUCTOR DEVICE Public/Granted day:2007-04-19
Information query
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