Invention Grant
US07662704B2 Electro-optical device, method of manufacturing the same, electronic apparatus, and semiconductor device 有权
电光装置及其制造方法,电子设备及半导体装置

Electro-optical device, method of manufacturing the same, electronic apparatus, and semiconductor device
Abstract:
An electro-optical device includes: a substrate; a plurality of pixel units provided in a display region on the substrate; and a driving circuit that is provided in a peripheral region surrounding the display region and includes semiconductor elements that drive the plurality of pixel units, each of the semiconductor elements having a first semiconductor layer and a second semiconductor layer. The first semiconductor layer has an SOI (silicon on insulator) structure including a first single crystal silicon layer, and the second semiconductor layer is formed of a second single crystal silicon layer that is formed on the first semiconductor layer by epitaxial growth.
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