Invention Grant
- Patent Title: Production process for a silicon compound
- Patent Title (中): 硅化合物的生产工艺
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Application No.: US12318736Application Date: 2009-01-07
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Publication No.: US07662985B2Publication Date: 2010-02-16
- Inventor: Mikio Yamahiro , Hisao Oikawa , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
- Applicant: Mikio Yamahiro , Hisao Oikawa , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
- Applicant Address: JP Osaka
- Assignee: Chisso Corporation
- Current Assignee: Chisso Corporation
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2003-062135 20030307
- Main IPC: C07F7/04
- IPC: C07F7/04
Abstract:
A production process for a silicon compound represented by Formula (6), characterized by reacting a compound represented by Formula (4) with a compound represented by Formula (5): wherein all of the variables are defined in the specification.
Public/Granted literature
- US20090143606A1 Production process for a silicon compound Public/Granted day:2009-06-04
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