Invention Grant
- Patent Title: Line-width measurement adjusting method and scanning electron microscope
- Patent Title (中): 线宽测量调整方法和扫描电子显微镜
-
Application No.: US11726966Application Date: 2007-03-23
-
Publication No.: US07663103B2Publication Date: 2010-02-16
- Inventor: Masayuki Kuribara , Jun Matsumoto
- Applicant: Masayuki Kuribara , Jun Matsumoto
- Applicant Address: JP Tokyo
- Assignee: Advantest Corp.
- Current Assignee: Advantest Corp.
- Current Assignee Address: JP Tokyo
- Agency: Muramatsu & Associates
- Priority: JP2006-084868 20060327
- Main IPC: G01N23/225
- IPC: G01N23/225

Abstract:
A line-width measurement adjusting method, which is used when first and second electron beam intensity distributions for measuring a line width are produced from intensity distribution images of secondary electrons obtained respectively by scanning a first irradiation distance with an electron beam at first magnification, and by scanning a second irradiation distance with an electron beam at second magnification, includes the step of adjusting the second electron beam intensity distribution of the electron beam at the second magnification such that the second electron beam intensity distribution is equal to the first electron beam intensity distribution of the electron beam at first magnification. The second electron beam intensity distribution may be adjusted by increasing or decreasing a second irradiation distance when producing the electron beam intensity distribution.
Public/Granted literature
- US20070284525A1 Line-width measurement adjusting method and scanning electron microscope Public/Granted day:2007-12-13
Information query