Invention Grant
- Patent Title: Beam recording method and device
- Patent Title (中): 光束记录方法和装置
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Application No.: US11813004Application Date: 2005-11-22
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Publication No.: US07663124B2Publication Date: 2010-02-16
- Inventor: Osamu Kasono , Osamu Kumasaka
- Applicant: Osamu Kasono , Osamu Kumasaka
- Applicant Address: JP Tokyo
- Assignee: Pioneer Corporation
- Current Assignee: Pioneer Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2004-379577 20041228
- International Application: PCT/JP2005/021934 WO 20051122
- International Announcement: WO2006/070555 WO 20060706
- Main IPC: G11B9/10
- IPC: G11B9/10

Abstract:
A recording device including a beam deflection section for relatively moving an irradiation position of an exposure beam with respect to a substrate on which a resist layer is formed; a substrate velocity adjustment section for adjusting a moving velocity of the substrate based on a deflection amount of the exposure beam; and a deflection control section for controlling to change a deflection velocity of the exposure beam during exposure of the recording signals according to the moving velocity of the substrate.
Public/Granted literature
- US20080093562A1 Beam Recording Method and Device Public/Granted day:2008-04-24
Information query
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