Invention Grant
US07663124B2 Beam recording method and device 有权
光束记录方法和装置

Beam recording method and device
Abstract:
A recording device including a beam deflection section for relatively moving an irradiation position of an exposure beam with respect to a substrate on which a resist layer is formed; a substrate velocity adjustment section for adjusting a moving velocity of the substrate based on a deflection amount of the exposure beam; and a deflection control section for controlling to change a deflection velocity of the exposure beam during exposure of the recording signals according to the moving velocity of the substrate.
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