Invention Grant
- Patent Title: Memory cell having a side electrode contact
- Patent Title (中): 具有侧面电极接触的存储单元
-
Application No.: US11864273Application Date: 2007-09-28
-
Publication No.: US07663135B2Publication Date: 2010-02-16
- Inventor: Hsiang-Lan Lung
- Applicant: Hsiang-Lan Lung
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
Memory cells are described along with methods for manufacturing. A memory cell as described herein includes a bottom electrode, a memory element and a side electrode. The bottom electrode contacts the memory element at a first contact surface on the bottom of the memory element. The side electrode contacts the memory element at a second contact surface on the side of the memory element, where the second contact surface on the side faces laterally relative to the first contact surface on the bottom.
Public/Granted literature
- US20080179584A1 MEMORY CELL HAVING A SIDE ELECTRODE CONTACT Public/Granted day:2008-07-31
Information query
IPC分类: