Invention Grant
- Patent Title: Nitride semiconductor light emitting element
- Patent Title (中): 氮化物半导体发光元件
-
Application No.: US11717052Application Date: 2007-03-13
-
Publication No.: US07663138B2Publication Date: 2010-02-16
- Inventor: Hajime Fujikura
- Applicant: Hajime Fujikura
- Applicant Address: JP Chiyoda-ku, Tokyo
- Assignee: Hitachi Cable, Ltd.
- Current Assignee: Hitachi Cable, Ltd.
- Current Assignee Address: JP Chiyoda-ku, Tokyo
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2006-133809 20060512
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L21/3205 ; H01S5/00

Abstract:
A n-type layer, a multiquantum well active layer comprising a plurality of pairs of an InGaN well layer/InGaN barrier layer, and a p-type layer are laminated on a substrate to provide a nitride semiconductor light emitting element. A composition of the InGaN barrier included in the multiquantum well active layer is expressed by InxGa1-xN (0.04≦x≦0.1), and a total thickness of InGaN layers comprising an In composition ratio within a range of 0.04 to 0.1 in the light emitting element including the InGaN barrier layers is not greater than 60 nm.
Public/Granted literature
- US20070262293A1 Nitride semiconductor light emitting element Public/Granted day:2007-11-15
Information query
IPC分类: