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US07663161B2 Transistor for preventing current collapse and having improved leakage current characteristics and method for fabricating the same 有权
用于防止电流塌陷并具有改善的漏电流特性的晶体管及其制造方法

Transistor for preventing current collapse and having improved leakage current characteristics and method for fabricating the same
Abstract:
A transistor includes: a first semiconductor layer and a second semiconductor layer with a first region and a second region, which are sequentially formed above a substrate; a first p-type semiconductor layer formed on a region of the second semiconductor layer other than the first and second regions; and a second p-type semiconductor layer formed on the first p-type semiconductor layer. The first p-type semiconductor layer is separated from a drain electrode by interposing therebetween a first groove having a bottom composed of the first region, and from a source electrode by interposing therebetween a second groove having a bottom composed of the second region.
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