Invention Grant
- Patent Title: Magneto-resistance effect element and magnetic memory
- Patent Title (中): 磁阻效应元件和磁存储器
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Application No.: US11228326Application Date: 2005-09-19
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Publication No.: US07663171B2Publication Date: 2010-02-16
- Inventor: Tomoaki Inokuchi , Yoshiaki Saito , Hideyuki Sugiyama
- Applicant: Tomoaki Inokuchi , Yoshiaki Saito , Hideyuki Sugiyama
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-082219 20050322
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
It is possible to reduce a current required for spin injection writing. A magneto-resistance effect element includes: a first magnetization pinned layer; a magnetization free layer; a tunnel barrier layer; a second magnetization pinned layer whose direction of magnetization is pinned to be substantially anti-parallel to the direction of magnetization of the first magnetization pinned layer, and; a non-magnetic layer. When the second magnetization pinned layer is made of ferromagnetic material including Co, material for the non-magnetic layer is metal including at least one element selected from the group consisting of Zr, Hf, Rh, Ag, and Au; when the second magnetization pinned layer is made of ferromagnetic material including Fe, material for the non-magnetic layer is metal including at least one element selected from the group consisting of Rh, Pt, Ir, Al, Ag, and Au; and when the second magnetization pinned layer is made of ferromagnetic material including Ni, material for the non-magnetic layer is metal including at least one element selected from the group consisting of Zr, Hf, Au, and Ag.
Public/Granted literature
- US20060227465A1 Magneto-resistance effect element and magnetic memory Public/Granted day:2006-10-12
Information query
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