Invention Grant
US07663205B2 Integrated circuit devices including a dummy gate structure below a passive electronic element
有权
集成电路器件,包括无源电子元件下方的虚拟栅极结构
- Patent Title: Integrated circuit devices including a dummy gate structure below a passive electronic element
- Patent Title (中): 集成电路器件,包括无源电子元件下方的虚拟栅极结构
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Application No.: US11042007Application Date: 2005-01-25
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Publication No.: US07663205B2Publication Date: 2010-02-16
- Inventor: Chulho Chung
- Applicant: Chulho Chung
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2004-0061159 20040803
- Main IPC: H01L29/00
- IPC: H01L29/00

Abstract:
Integrated circuit devices include a semiconductor substrate and a flux line generating passive electronic element on the semiconductor substrate. A dummy gate structure is arranged on the semiconductor substrate in a region below the passive electronic element. The dummy gate includes a plurality of segments, each segment including a first longitudinally extending part and a second longitudinally extending part. The second longitudinally extending part extends at an angle from an end of the first longitudinally extending part. Ones of the segments extend at a substantially same angle and are arranged displaced from each other in an adjacent nested relationship.
Public/Granted literature
- US20060030115A1 Integrated circuit devices including passive device shielding structures and methods of forming the same Public/Granted day:2006-02-09
Information query
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