Invention Grant
US07663230B2 Methods of forming channels on an integrated circuit die and die cooling systems including such channels
有权
在集成电路管芯上形成通道的方法和包括这种通道的模具冷却系统
- Patent Title: Methods of forming channels on an integrated circuit die and die cooling systems including such channels
- Patent Title (中): 在集成电路管芯上形成通道的方法和包括这种通道的模具冷却系统
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Application No.: US12080682Application Date: 2008-04-04
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Publication No.: US07663230B2Publication Date: 2010-02-16
- Inventor: Shriram Ramanathan , Chin Chang Cheng , Alan M. Myers
- Applicant: Shriram Ramanathan , Chin Chang Cheng , Alan M. Myers
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agent Kenneth A. Nelson
- Main IPC: H01L23/34
- IPC: H01L23/34

Abstract:
A method of forming channels on a die or other substrate. Also disclosed are liquid cooling systems including such channels.
Public/Granted literature
- US20080185714A1 Methods of forming channels on an integrated circuit die and die cooling systems including such channels Public/Granted day:2008-08-07
Information query
IPC分类: