Invention Grant
- Patent Title: Lithographic apparatus, device manufacturing method, calibration method and computer program product
- Patent Title (中): 光刻设备，器件制造方法，校准方法和计算机程序产品
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Application No.: US10929882Application Date: 2004-08-31
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Publication No.: US07663741B2Publication Date: 2010-02-16
- Inventor: Hans Van Der Laan , Christian Wagner
- Applicant: Hans Van Der Laan , Christian Wagner
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01B9/00
- IPC: G01B9/00 ; G03B27/32 ; G03C5/00
Abstract:
To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.
Public/Granted literature
- US20060046165A1 Lithographic apparatus, device manufacturing method, calibration method and computer program product Public/Granted day:2006-03-02
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