Invention Grant
- Patent Title: Method and apparatus for scanning, stitching and damping measurements of a double sided metrology inspection tool
- Patent Title (中): 用于双面计量检测工具的扫描,缝合和阻尼测量的方法和装置
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Application No.: US12287290Application Date: 2008-10-07
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Publication No.: US07663746B2Publication Date: 2010-02-16
- Inventor: Paul J. Sullivan , Geroge Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
- Applicant: Paul J. Sullivan , Geroge Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Techologies Corporation
- Current Assignee: KLA-Tencor Techologies Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Smyrski Law Group, A P.C.
- Main IPC: G01N21/84
- IPC: G01N21/84

Abstract:
A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a damping arrangement which filters unwanted acoustic and seismic vibration, including an optics arrangement which scans a first portion of the specimen and a translation or rotation arrangement for translating or rotating the specimen to a position where the optics arrangement can scan the remaining portion(s) of the specimen. The system further includes means for stitching the scans together, thereby providing both damping of the specimen and the need for smaller and less expensive optical elements.
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