Invention Grant
- Patent Title: Method for calculating optical constants and substrate processing system
- Patent Title (中): 光学常数和基板处理系统的计算方法
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Application No.: US11932274Application Date: 2007-10-31
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Publication No.: US07663760B2Publication Date: 2010-02-16
- Inventor: Toshihiko Kikuchi
- Applicant: Toshihiko Kikuchi
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-305845 20061110
- Main IPC: G01N21/55
- IPC: G01N21/55
Abstract:
An optical constant calculation method capable of calculating an accurate optical constant of an underlayer film to accurately identify a substrate surface structure. After each of films is layered on a wafer, there are measured the reflectivity of an oxide film under which an organic insulation film is formed and the reflectivity of an organic insulation film exposed after removal by plasma of the oxide film. Based on the measured reflectivities, the optical constant of the organic insulation film after being altered by heat treatment and the optical constant of the organic insulation film after being altered by plasma are calculated.
Public/Granted literature
- US20080297801A1 METHOD FOR CALCULATING OPTICAL CONSTANTS AND SUBSTRATE PROCESSING SYSTEM Public/Granted day:2008-12-04
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