Invention Grant
- Patent Title: Electrostatic chuck
- Patent Title (中): 静电吸盘
-
Application No.: US11001298Application Date: 2004-12-02
-
Publication No.: US07663860B2Publication Date: 2010-02-16
- Inventor: Shinya Nishimoto , Hiroyuki Nakayama , Hidetoshi Kimura
- Applicant: Shinya Nishimoto , Hiroyuki Nakayama , Hidetoshi Kimura
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2003-408224 20031205
- Main IPC: H01T23/00
- IPC: H01T23/00

Abstract:
An electrostatic chuck for attracting and holding a substrate by using an electrostatic force includes a plurality of protrusion portions to be brought into contact with the substrate. The protrusion portions are formed of a ceramic dielectric including grains each having a specified particle diameter, and contact surfaces of the protrusion portions with the substrate are formed to have a surface roughness depending on the particle diameter.
Public/Granted literature
- US20050207088A1 Electrostatic chuck Public/Granted day:2005-09-22
Information query