Invention Grant
- Patent Title: Gas laser oscillating unit
- Patent Title (中): 气体激光振荡单元
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Application No.: US11771725Application Date: 2007-06-29
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Publication No.: US07664155B2Publication Date: 2010-02-16
- Inventor: Akira Egawa , Takafumi Murakami , Akihiko Nishio
- Applicant: Akira Egawa , Takafumi Murakami , Akihiko Nishio
- Applicant Address: JP Yamanashi
- Assignee: Fanuc Ltd
- Current Assignee: Fanuc Ltd
- Current Assignee Address: JP Yamanashi
- Agency: Lowe Hauptman Ham & Berner LLP
- Priority: JP2006-192929 20060713
- Main IPC: H01S3/03
- IPC: H01S3/03 ; H01S3/223

Abstract:
A gas laser oscillating unit having a gas junction part where gas flow may be stable, whereby a stable laser beam output and/or a laser beam that does not fluctuate very much may be achieved. The laser gas, flowing through first and second excitation parts, is introduced into the first and second tapered gas flow passages. After that, the two gas flows are mixed at or near the center point of a gas junction part and the mixed gas flows in a next flow passage. Then, one of the gas flows from the first excitation part is biased toward the −X direction by a first biasing member arranged in the first gas flow passage, and the other gas flow from the second excitation part is biased toward the +X direction by a second biasing member arranged in the second gas flow passage.
Public/Granted literature
- US20080013585A1 GAS LASER OSCILLATING UNIT Public/Granted day:2008-01-17
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