Invention Grant
US07664307B2 Photomask manufacturing support system 有权
光掩模制造支持系统

  • Patent Title: Photomask manufacturing support system
  • Patent Title (中): 光掩模制造支持系统
  • Application No.: US11092708
    Application Date: 2005-03-30
  • Publication No.: US07664307B2
    Publication Date: 2010-02-16
  • Inventor: Yasuko Saito
  • Applicant: Yasuko Saito
  • Applicant Address: JP Tokyo
  • Assignee: NEC Corporation
  • Current Assignee: NEC Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Young & Thompson
  • Priority: JP2004-097857 20040330
  • Main IPC: G06K9/00
  • IPC: G06K9/00
Photomask manufacturing support system
Abstract:
A drawing data inputting/interpreting section of a data processing device reads in hierarchical structured drawing data from a first memory device and stores interpreted drawing data information extracted as graphic information in a second memory device. A data analysis section reads in the interpreted drawing data information, analyzes information necessary for a drawing step, and stores the same as drawing analysis results in the second memory device. In addition, a data conversion section reads in the interpreted drawing data information, and after a format conversion to inspection data, stores the converted inspection data in the second memory device. Thereby, a drawing data analysis step and an inspecting data conversion step can be carried out in parallel.
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