Invention Grant
- Patent Title: Photomask manufacturing support system
- Patent Title (中): 光掩模制造支持系统
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Application No.: US11092708Application Date: 2005-03-30
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Publication No.: US07664307B2Publication Date: 2010-02-16
- Inventor: Yasuko Saito
- Applicant: Yasuko Saito
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Young & Thompson
- Priority: JP2004-097857 20040330
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A drawing data inputting/interpreting section of a data processing device reads in hierarchical structured drawing data from a first memory device and stores interpreted drawing data information extracted as graphic information in a second memory device. A data analysis section reads in the interpreted drawing data information, analyzes information necessary for a drawing step, and stores the same as drawing analysis results in the second memory device. In addition, a data conversion section reads in the interpreted drawing data information, and after a format conversion to inspection data, stores the converted inspection data in the second memory device. Thereby, a drawing data analysis step and an inspecting data conversion step can be carried out in parallel.
Public/Granted literature
- US20050223349A1 Photomask manufacturing support system Public/Granted day:2005-10-06
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