Invention Grant
- Patent Title: Reticle inspecting apparatus and reticle inspecting method
- Patent Title (中): 标线检查装置和掩模版检查方法
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Application No.: US11320858Application Date: 2005-12-30
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Publication No.: US07664309B2Publication Date: 2010-02-16
- Inventor: Tsutomu Horie , Yuichi Tokumaru
- Applicant: Tsutomu Horie , Yuichi Tokumaru
- Applicant Address: JP Tokyo
- Assignee: Fujitsu Microelectronics Limited
- Current Assignee: Fujitsu Microelectronics Limited
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2005-000706 20050105; JP2005-334985 20051118
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
The present invention efficiently suppresses a false defect and realizes reticle inspection where a defect can be detected with high detection sensitivity. In a reticle inspecting method, reticle inspection data generated based on reticle design data is captured. Also, drawing position accuracy measurement data of the reticle is captured to obtain a first correction amount for correcting a position accuracy component of the reticle. Based on the first correction amount, the inspection data is corrected. Based on the corrected inspection data, a defect on the reticle is detected.
Public/Granted literature
- US20060147104A1 Reticle inspecting apparatus and reticle inspecting method Public/Granted day:2006-07-06
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