Invention Grant
- Patent Title: Index layout measurement method, position and orientation estimation method, index layout measurement apparatus, and position and orientation estimation apparatus
- Patent Title (中): 索引布局测量方法,位置和方向估计方法,索引布局测量装置,位置和方向估计装置
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Application No.: US11611404Application Date: 2006-12-15
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Publication No.: US07664341B2Publication Date: 2010-02-16
- Inventor: Rika Takemoto , Shinji Uchiyama
- Applicant: Rika Takemoto , Shinji Uchiyama
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2005-026879 20050202
- Main IPC: G06K9/36
- IPC: G06K9/36 ; H04N1/46

Abstract:
An index layout measurement method and apparatus measures a relative layout relationship between a first index or index group which exists in a given first region in a physical space and a second index or index group which exists in a second region. The method includes a first image sensing step of sensing an image so as to simultaneously include some or all of the first index/index group and an auxiliary index which is temporarily laid out in the physical space and a position and orientation in a three-dimensional space of which can be defined, a second image sensing step of sensing an image so as to simultaneously include some or all of the second index/index group and the auxiliary index, and a layout calculation step of calculating a relative layout relationship among the first index/index group, the auxiliary index, and the second index/index group from one or a plurality of images obtained by performing the first image sensing step once or repeating it a plurality of number of times, and one or a plurality of images obtained by performing the second image sensing step once or repeating it a plurality of number of times. The auxiliary index is removed after the layout relationship among the respective indices laid out in the physical space is calculated.
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