Invention Grant
- Patent Title: System and method for vacuum generated imprinting
- Patent Title (中): 真空产生印记的系统和方法
-
Application No.: US12116134Application Date: 2008-05-06
-
Publication No.: US07665399B2Publication Date: 2010-02-23
- Inventor: Todd L. Biggs , Jeff R. Wienrich
- Applicant: Todd L. Biggs , Jeff R. Wienrich
- Applicant Address: US CA Santa Clara
- Assignee: INTEL Corporation
- Current Assignee: INTEL Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Marger, Johnson & McCollom, P.C.
- Main IPC: B31F1/07
- IPC: B31F1/07

Abstract:
A system to imprint patterns on impressionable materials by generating a pressure differential within an imprinting chamber by creating a substantial vacuum in an imprinting area is provided. This system can be used to create conductive traces in a substrate onto which integrated circuit chips and dies can be mounted to create semiconductor packages. A low pressure line evacuates air from a material receiving area of a vessel creating a pressure differential across pistons in the vessel to thereby causing the pistons to press microtools into impressionable material layers. The low pressure line helps the microtools conform to any thickness variations in the imprinted material and prevents air pockets from developing between the microtool and the imprinted material.
Public/Granted literature
- US20080202363A1 SYSTEM AND METHOD FOR VACUUM GENERATED IMPRINTING Public/Granted day:2008-08-28
Information query