Invention Grant
- Patent Title: Method of manufacturing display device
- Patent Title (中): 显示装置的制造方法
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Application No.: US10577648Application Date: 2004-11-18
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Publication No.: US07666050B2Publication Date: 2010-02-23
- Inventor: Akio Yamashita , Yumiko Fukumoto , Yuugo Goto
- Applicant: Akio Yamashita , Yumiko Fukumoto , Yuugo Goto
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2003-399978 20031128
- International Application: PCT/JP2004/017522 WO 20041118
- International Announcement: WO2005/052892 WO 20050609
- Main IPC: H01J9/00
- IPC: H01J9/00

Abstract:
To provide a method of manufacturing a display device having an excellent impact resistance property with high yield, in particular, a method using a plastic substrate. The method of manufacturing a display device includes metal film, an oxide film, and an optical filter on a first substrate; separating layers including the optical filter from the first substrate; attaching layers including the optical filter to a second substrate; forming a layer including a pixel on a surface of a third substrate; attaching the layer including the pixel to a fourth substrate; and attaching layers including the optical filter to another surface of the third substrate.
Public/Granted literature
- US20080171484A1 Method of Manufacturing Display Device Public/Granted day:2008-07-17
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