Invention Grant
- Patent Title: Gas sensor
- Patent Title (中): 气体传感器
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Application No.: US10807859Application Date: 2004-03-24
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Publication No.: US07666286B2Publication Date: 2010-02-23
- Inventor: Hiroshi Kurachi , Yuichi Sasaki , Takeya Miyashita
- Applicant: Hiroshi Kurachi , Yuichi Sasaki , Takeya Miyashita
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown
- Priority: JP2003-096625 20030331; JP2004-072027 20040315
- Main IPC: G01N27/26
- IPC: G01N27/26 ; G01N7/00

Abstract:
A gas sensor includes a first space for a measurement gas from a gas-introducing hole via a first diffusion rate-determining section, a main pumping means for controlling a partial pressure of oxygen in the measurement gas introduced into the first space to have a predetermined value, a second space for the measurement gas from the first space via a second diffusion rate-determining section, and a measuring pumping means for reducing or decomposing a NOx component in the measurement gas introduced from the second space via a third diffusion rate-determining section so that oxygen produced thereby is pumped out to detect a current generated by pumping out the oxygen. A ratio (Wc/We) between a width (We) of an end of a sensor element and a width (Wc) of the gas-introducing hole is not less than 0.3 and less than 0.7.
Public/Granted literature
- US20040188251A1 Gas sensor Public/Granted day:2004-09-30
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