Invention Grant
US07666379B2 Process and apparatus for removing Bronsted acid impurities in binary halides
有权
用于去除二元卤化物中的布朗斯台德酸杂质的方法和装置
- Patent Title: Process and apparatus for removing Bronsted acid impurities in binary halides
- Patent Title (中): 用于去除二元卤化物中的布朗斯台德酸杂质的方法和装置
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Application No.: US11293775Application Date: 2005-12-02
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Publication No.: US07666379B2Publication Date: 2010-02-23
- Inventor: Leisl Dukhedin-Lalla , German Shekk , John P. de Neufville , Michael Pikulin
- Applicant: Leisl Dukhedin-Lalla , German Shekk , John P. de Neufville , Michael Pikulin
- Applicant Address: US NJ North Branch
- Assignee: Voltaix, Inc.
- Current Assignee: Voltaix, Inc.
- Current Assignee Address: US NJ North Branch
- Agency: Ryndak & Suri LLP
- Main IPC: C01B33/10
- IPC: C01B33/10 ; B01D53/04 ; B01D53/68
Abstract:
A process and apparatus is provided for the purification of binary halide fluid. The process and apparatus purifies the binary halide fluid by selectively removing Bronsted acid impurities and/or volatile oxygen containing impurities present in the binary halide. A regenerable adsorbent polymer is utilized to remove the Bronsted acid impurities from the binary halide fluid and a volatile oxide adsorbent having a specific adsorption capacity for the volatile oxide impurity is utilized to remove the volatile oxide from the binary halide when in gaseous form.
Public/Granted literature
- US20060133986A1 Process and apparatus for removing Bronsted acid impurities in binary halides Public/Granted day:2006-06-22
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