Invention Grant
US07666553B2 Fabrication method for photomask, fabrication method for device and monitoring method for photomask
有权
光掩模的制造方法，装置的制造方法和光掩模的监视方法
- Patent Title: Fabrication method for photomask, fabrication method for device and monitoring method for photomask
- Patent Title (中): 光掩模的制造方法，装置的制造方法和光掩模的监视方法
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Application No.: US11384240Application Date: 2006-03-21
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Publication No.: US07666553B2Publication Date: 2010-02-23
- Inventor: Koji Hosono , Yukihiro Sato
- Applicant: Koji Hosono , Yukihiro Sato
- Applicant Address: JP Tokyo
- Assignee: Fujitsu Microelectronics Limited
- Current Assignee: Fujitsu Microelectronics Limited
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2005-360526 20051214
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03F7/20
Abstract:
A fabrication method for a photomask is disclosed. Two or more metal containing layers are formed over a substrate, and a main pattern and a monitor pattern are formed over one or more of the two or more metal containing layers other than the lowermost metal containing layer. Then, the monitor pattern is measured, and the monitor pattern after being measured is removed. Then, the main pattern is formed over the lowermost metal containing layer to fabricate a photomask formed from the two or more metal containing layers.
Public/Granted literature
- US20070134562A1 Fabrication method for photomask, fabrication method for device and monitoring method for photomask Public/Granted day:2007-06-14
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