Invention Grant
US07666568B2 Composition and method for providing a patterned metal layer having high conductivity
失效
用于提供具有高导电性的图案化金属层的组合物和方法
- Patent Title: Composition and method for providing a patterned metal layer having high conductivity
- Patent Title (中): 用于提供具有高导电性的图案化金属层的组合物和方法
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Application No.: US11877637Application Date: 2007-10-23
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Publication No.: US07666568B2Publication Date: 2010-02-23
- Inventor: Feng Gao , Lynda Kaye Johnson , Roupen Leon Keusseyan , Dalen E. Keys , Irina Malajovich , Rinaldo S. Schiffino , Fredrick Claus Zumsteg, Jr.
- Applicant: Feng Gao , Lynda Kaye Johnson , Roupen Leon Keusseyan , Dalen E. Keys , Irina Malajovich , Rinaldo S. Schiffino , Fredrick Claus Zumsteg, Jr.
- Applicant Address: US DE Wilmington
- Assignee: E. I. du Pont de Nemours and Company
- Current Assignee: E. I. du Pont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- Agent Gail D. Tanzer
- Main IPC: G03C8/00
- IPC: G03C8/00
Abstract:
Disclosed is a method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical devices including electromagnetic interference shielding devices and touchpad sensors.
Public/Granted literature
- US20090104572A1 COMPOSITION AND METHOD FOR PROVIDING A PATTERNED METAL LAYER HAVING HIGH CONDUCTIVITY Public/Granted day:2009-04-23
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