Invention Grant
- Patent Title: High nucleation density organometallic compounds
- Patent Title (中): 高成核密度的有机金属化合物
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Application No.: US11497351Application Date: 2006-08-02
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Publication No.: US07667065B2Publication Date: 2010-02-23
- Inventor: David M. Thompson
- Applicant: David M. Thompson
- Applicant Address: US CT Danbury
- Assignee: Praxair Technology, Inc.
- Current Assignee: Praxair Technology, Inc.
- Current Assignee Address: US CT Danbury
- Agent Iurie A. Schwartz
- Main IPC: C07F17/00
- IPC: C07F17/00 ; C07F15/00
Abstract:
This invention relates to high nucleation density organometallic ruthenium compounds. This invention also relates to a process for producing a high nucleation density organometallic ruthenium compound comprising reacting a bis(substituted-pentadienyl)ruthenium compound with a substituted cyclopentadiene compound under reaction conditions sufficient to produce said high nucleation density organometallic ruthenium compound. This invention further relates to a method for producing a film, coating or powder by decomposing a high nucleation density organometallic ruthenium compound precursor, thereby producing the film, coating or powder.
Public/Granted literature
- US20080032503A1 High nucleation density organometallic compounds Public/Granted day:2008-02-07
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