Invention Grant
- Patent Title: Phase change memory devices and methods for fabricating the same
- Patent Title (中): 相变存储器件及其制造方法
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Application No.: US11708323Application Date: 2007-02-21
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Publication No.: US07667221B2Publication Date: 2010-02-23
- Inventor: Jong-Heui Song , Yong-Sun Ko , Jae-Seung Hwang , Jun Seo
- Applicant: Jong-Heui Song , Yong-Sun Ko , Jae-Seung Hwang , Jun Seo
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2006-0016800 20060221
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
In a phase change memory, an interlayer insulating layer is disposed on a substrate. A heater plug includes a lower portion disposed in a contact hole penetrating the interlayer insulating layer and an upper portion protruding upward over the top surface of the interlayer insulating layer. A phase change pattern is disposed on the interlayer insulating layer to cover the top surface and the side surface of the protruding portion of the heater plug. An insulating spacer is interposed between the phase change pattern and the side surface of the protruding portion of the heater plug. A capping electrode is disposed on the phase change pattern.
Public/Granted literature
- US20070194294A1 Phase change memory devices and methods for fabricating the same Public/Granted day:2007-08-23
Information query
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