Invention Grant
- Patent Title: Semiconductor integrated circuit and method for manufacturing the same
- Patent Title (中): 半导体集成电路及其制造方法
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Application No.: US11976963Application Date: 2007-10-30
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Publication No.: US07667316B2Publication Date: 2010-02-23
- Inventor: Shingo Fukamizu , Yutaka Nabeshima , Takashi Katsuyama
- Applicant: Shingo Fukamizu , Yutaka Nabeshima , Takashi Katsuyama
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-295689 20061031; JP2006-325465 20061201
- Main IPC: H01L23/49
- IPC: H01L23/49 ; H01L21/44

Abstract:
A semiconductor integrated circuit includes a power transistor formed on a semiconductor substrate, a plurality of first metal patterns and a plurality of second metal patterns which are formed right above the power transistor and function as a first electrode and as a second electrode of the power transistor, respectively, a plurality of first buses each electrically connected with, of a plurality of first metal patterns, a corresponding first metal pattern, a plurality of second buses each electrically connected with, of a plurality of second metal patterns, a corresponding second metal pattern, wherein one contact pad is provided to each of a plurality of first buses and a plurality of second buses.
Public/Granted literature
- US20080099783A1 Semiconductor integrated circuit and method for manufacturing the same Public/Granted day:2008-05-01
Information query
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