Invention Grant
- Patent Title: Detector configurations for optical metrology
- Patent Title (中): 用于光学计量的检测器配置
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Application No.: US12288395Application Date: 2008-10-20
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Publication No.: US07667841B2Publication Date: 2010-02-23
- Inventor: Jon Opsal
- Applicant: Jon Opsal
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Morrison & Foerster LLP
- Main IPC: G01N11/06
- IPC: G01N11/06

Abstract:
An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.
Public/Granted literature
- US20090066954A1 Detector configurations for optical metrology Public/Granted day:2009-03-12
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