Invention Grant
US07668016B2 Non-volatile memory devices and programming methods thereof including moving electrons through pad oxide layers between charge trap layers
失效
非易失性存储器件及其编程方法,包括通过电荷陷阱层之间的衬垫氧化物层移动电子
- Patent Title: Non-volatile memory devices and programming methods thereof including moving electrons through pad oxide layers between charge trap layers
- Patent Title (中): 非易失性存储器件及其编程方法,包括通过电荷陷阱层之间的衬垫氧化物层移动电子
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Application No.: US12078141Application Date: 2008-03-27
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Publication No.: US07668016B2Publication Date: 2010-02-23
- Inventor: Jung-hun Sung , Kwang-soo Seol , Woong-chul Shin , Sang-jin Park , Sang-moo Choi
- Applicant: Jung-hun Sung , Kwang-soo Seol , Woong-chul Shin , Sang-jin Park , Sang-moo Choi
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2007-0077175 20070731
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
Non-volatile memory devices and methods of programming a non-volatile memory device in which electrons are moved between charge trap layers through a pad oxide layer are provided. The non-volatile memory devices include a charge trap layer on a semiconductor substrate and storing electrons, a pad oxide layer on the first charge trap layer, and a second trap layer on the pad oxide layer and storing electrons. In a programming mode in which data is written, the stored electrons are moved between a first position of the first charge trap layer and a first position of the second charge trap layer through the pad oxide layer or between a second position of the first charge trap layer and a second position of the second charge trap layer through the pad oxide layer.
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