Invention Grant
- Patent Title: Oblique projection optical system
- Patent Title (中): 倾斜投影光学系统
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Application No.: US11266674Application Date: 2005-11-03
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Publication No.: US07670008B2Publication Date: 2010-03-02
- Inventor: Tomiei Kuwa
- Applicant: Tomiei Kuwa
- Applicant Address: JP Hachioji-shi
- Assignee: Konica Minolta Opto, Inc.
- Current Assignee: Konica Minolta Opto, Inc.
- Current Assignee Address: JP Hachioji-shi
- Agency: Sidley Austin LLP
- Priority: JP2004-325954 20041110
- Main IPC: G03B21/28
- IPC: G03B21/28

Abstract:
In an oblique projection optical system for performing enlargement projection from a primary image surface on the reduction side to a secondary image surface on the enlargement side, at least one reflective surface having an optical power is provided, and, assuming that of the aforementioned surfaces, the reflective surface located on the most secondary image surface side in the optical path is a first curved reflective surface, the first curved reflective surface has a portion having a positive optical power and a portion having a negative optical power.
Public/Granted literature
- US20060164605A1 Oblique projection optical system Public/Granted day:2006-07-27
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