Invention Grant
- Patent Title: Multistage vacuum pump and a pumping installation including such a pump
- Patent Title (中): 多级真空泵和包括这种泵的抽水设备
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Application No.: US11109798Application Date: 2005-04-20
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Publication No.: US07670119B2Publication Date: 2010-03-02
- Inventor: Pascal Durand , Jean-François Vuillermoz , Patrick Pilotti , Jean-François Grosdaillon
- Applicant: Pascal Durand , Jean-François Vuillermoz , Patrick Pilotti , Jean-François Grosdaillon
- Applicant Address: FR Paris
- Assignee: ALCATEL
- Current Assignee: ALCATEL
- Current Assignee Address: FR Paris
- Agency: Sughrue Mion, PLLC
- Priority: FR0450741 20040421
- Main IPC: F04C2/00
- IPC: F04C2/00 ; F04C23/00

Abstract:
The present invention provides a multistage vacuum pump comprising at least a low pressure first stage and at least a high pressure second stage. At least one of the stages has at least one suction inlet for admitting gas to be pumped, and at least one of the stages has at least one delivery outlet that is open to the outside for exhausting pumped gas. The first and second stages communicate with each other in order to pass gas from the first stage to the second stage. The first stage operates at a flow rate that is smaller than that of the second stage. For an oil-seal rotary vane positive-displacement pump, the oil is injected into the stage having the greater flow rate.
Public/Granted literature
- US20050238502A1 Multistage vacuum pump and a pumping installation including such a pump Public/Granted day:2005-10-27
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