Invention Grant
- Patent Title: Exhaust system for a vacuum processing system
- Patent Title (中): 真空处理系统排气系统
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Application No.: US11369754Application Date: 2006-03-08
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Publication No.: US07670432B2Publication Date: 2010-03-02
- Inventor: Yicheng Li
- Applicant: Yicheng Li
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: C23C16/505
- IPC: C23C16/505 ; H01L21/363

Abstract:
A method, computer readable medium, and system for treating a substrate in a process space of a vacuum processing system is described. A vacuum pump in fluid communication with the vacuum processing system and configured to evacuate the process space, while a process material supply system is pneumatically coupled to the vacuum processing system and configured to supply a process gas to the process space. Additionally, the vacuum pump is pneumatically coupled to the process supply system and configured to, at times, evacuate the process gas supply system.
Public/Granted literature
- US20070209588A1 Exhaust system for a vacuum processing system Public/Granted day:2007-09-13
Information query
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