Invention Grant
US07670497B2 Oxidant and passivant composition and method for use in treating a microelectronic structure
失效
氧化剂和钝化剂组合物和用于处理微电子结构的方法
- Patent Title: Oxidant and passivant composition and method for use in treating a microelectronic structure
- Patent Title (中): 氧化剂和钝化剂组合物和用于处理微电子结构的方法
-
Application No.: US11774041Application Date: 2007-07-06
-
Publication No.: US07670497B2Publication Date: 2010-03-02
- Inventor: John A. Fitzsimmons , David L. Rath , Shom Ponoth , Michael Beck
- Applicant: John A. Fitzsimmons , David L. Rath , Shom Ponoth , Michael Beck
- Applicant Address: US NY Armonk DE Neubiberg
- Assignee: International Business Machines Corporation,Infineon Technologies AG
- Current Assignee: International Business Machines Corporation,Infineon Technologies AG
- Current Assignee Address: US NY Armonk DE Neubiberg
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent H. Daniel Schnurmann
- Main IPC: H01B13/00
- IPC: H01B13/00
Abstract:
A composition that may be used for cleaning a metal containing conductor layer, such as a copper containing conductor layer, within a microelectronic structure includes an aqueous acid, along with an oxidant material and a passivant material contained within the aqueous acid. The composition does not include an abrasive material. The composition is particularly useful for cleaning a residue from a copper containing conductor layer and an adjoining dielectric layer that provides an aperture for accessing the copper containing conductor layer within a microelectronic structure.
Public/Granted literature
- US20090008361A1 OXIDANT AND PASSIVANT COMPOSITION AND METHOD FOR USE IN TREATING A MICROELECTRONIC STRUCTURE Public/Granted day:2009-01-08
Information query
