Invention Grant
- Patent Title: Rapid sterilization system
- Patent Title (中): 快速灭菌系统
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Application No.: US11093526Application Date: 2005-03-30
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Publication No.: US07670550B2Publication Date: 2010-03-02
- Inventor: Szu-Min Lin , Paul T. Jacobs , Jenn-Hann Wang , James P. Kohler , Richard Jed Kendall , Harold R. Williams , Robert Lukasik
- Applicant: Szu-Min Lin , Paul T. Jacobs , Jenn-Hann Wang , James P. Kohler , Richard Jed Kendall , Harold R. Williams , Robert Lukasik
- Applicant Address: US NJ Somerville
- Assignee: Ethicon, Inc.
- Current Assignee: Ethicon, Inc.
- Current Assignee Address: US NJ Somerville
- Main IPC: A61L2/20
- IPC: A61L2/20

Abstract:
A method of sterilizing an article includes placing the article into a chamber containing an inner atmosphere and exhausting the inner atmosphere to lower pressure in the chamber. Hydrogen peroxide vapor is present in the chamber during at least a portion of the step of exhausting the inner atmosphere. Exhaustion of the inner atmosphere is terminated and additional hydrogen peroxide is admitted into the chamber. Hydrogen peroxide vapor contacts the article for a sufficient period to effect sterilization of the article.
Public/Granted literature
- US20050244297A1 Rapid sterilization system Public/Granted day:2005-11-03
Information query
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