Invention Grant
- Patent Title: Method and system for dispensing resist solution
- Patent Title (中): 分配抗蚀剂溶液的方法和系统
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Application No.: US10880556Application Date: 2004-07-01
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Publication No.: US07670643B2Publication Date: 2010-03-02
- Inventor: Thomas Winter , Minoru Kubota
- Applicant: Thomas Winter , Minoru Kubota
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: B05D1/02
- IPC: B05D1/02 ; B05D3/12

Abstract:
An apparatus and method for dispensing a solution on a substrate is described in which the solution is dispensed through a solution nozzle assembly while the substrate is rotated. As the solution is dispensed, the solution on the substrate forms a wave front that radially spreads from the substrate center to the substrate edge. The dispensing of the solution is performed in such a way that the solution is dispensed at a radial location substantially equivalent to or less than the radial location of the wave front at any instant in time.
Public/Granted literature
- US20060013953A1 Method and system for dispensing resist solution Public/Granted day:2006-01-19
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