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US07670643B2 Method and system for dispensing resist solution 失效
分配抗蚀剂溶液的方法和系统

Method and system for dispensing resist solution
Abstract:
An apparatus and method for dispensing a solution on a substrate is described in which the solution is dispensed through a solution nozzle assembly while the substrate is rotated. As the solution is dispensed, the solution on the substrate forms a wave front that radially spreads from the substrate center to the substrate edge. The dispensing of the solution is performed in such a way that the solution is dispensed at a radial location substantially equivalent to or less than the radial location of the wave front at any instant in time.
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