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US07670646B2 Methods for atomic-layer deposition 失效
原子层沉积方法

Methods for atomic-layer deposition
Abstract:
Atomic-Layer deposition systems and methods provide a variety of electronic products. In an embodiment, a method uses an atomic-layer deposition system that includes an outer chamber, a substrate holder, and a gas-distribution fixture that engages or cooperates with the substrate holder to form an inner chamber within the outer chamber. The inner chamber has a smaller volume than the outer chamber, which leads to less time to fill and purge during cycle times for deposition of materials.
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