Invention Grant
- Patent Title: Heat-resistant, light-shielding film, production thereof, and aperture and light intensity adjusting device using the same
- Patent Title (中): 耐热,遮光膜,其制造方法以及使用其的孔径光强度调节装置
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Application No.: US11984938Application Date: 2007-11-26
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Publication No.: US07670673B2Publication Date: 2010-03-02
- Inventor: Katsushi Ono , Yoshiyuki Abe , Yukio Tsukakoshi
- Applicant: Katsushi Ono , Yoshiyuki Abe , Yukio Tsukakoshi
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Metal Mining Co., Ltd.
- Current Assignee: Sumitomo Metal Mining Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Edwards Angell Palmer & Dodge LLP
- Priority: JP2006-323368 20061130; JP2007-084119 20070328
- Main IPC: B32B15/04
- IPC: B32B15/04 ; B32B15/08

Abstract:
A heat-resistant, light-shielding film having high light shielding capacity, high heat resistance, high sliding characteristics, low surface gloss and high electroconductivity, and useful for optical device parts, e.g., shutter or aperture blades for digital cameras and digital video cameras, and aperture blades for adjusting light intensity for projectors; method for producing the film; and aperture and light intensity adjusting device using the film.The heat-resistant, light-shielding film comprising a heat-resistant resin film base (A) resistant to 200° C. or higher, coated, on one or both sides, with an Ni-base metallic film (B) having a thickness of 50 nm or more by sputtering and then with a low-reflectivity film (C) of Ni-base oxide also by sputtering, and having a surface roughness (arithmetic average height Ra) of 0.1 to 0.7 μm.
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