Invention Grant
- Patent Title: Erosion-resistant components for plasma process chambers
- Patent Title (中): 等离子体处理室的耐腐蚀组件
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Application No.: US09892212Application Date: 2001-06-25
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Publication No.: US07670688B2Publication Date: 2010-03-02
- Inventor: Tony S. Kaushal , You Wang , Ananda H. Kumar
- Applicant: Tony S. Kaushal , You Wang , Ananda H. Kumar
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Mayer & Williams PC
- Agent David B. Bonham, Esq.; Keum J. Park, Esq.
- Main IPC: B32B15/04
- IPC: B32B15/04 ; B32B9/00 ; C23C16/00

Abstract:
An erosion-resistant article for use as a component in plasma process chamber. The erosion-resistant article comprises a support and an oxide coating comprising yttrium, which is disposed over the support. The support and the oxide coating preferably have material compositions that differ from one another in coefficient of thermal expansion by no more than 5×10−6/K. Preferred oxide coating compositions include yttria and yttrium aluminum garnet. Preferred supports include alumina supports and aluminum-silicon carbide supports.
Public/Granted literature
- US20040033385A1 Erosion-resistant components for plasma process chambers Public/Granted day:2004-02-19
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