Invention Grant
- Patent Title: Optical masks and methods for measuring aberration of a beam
- Patent Title (中): 用于测量光束像差的光学掩模和方法
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Application No.: US11311109Application Date: 2005-12-19
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Publication No.: US07670725B2Publication Date: 2010-03-02
- Inventor: Chan Hwang , Suk-Joo Lee , Han-Ku Cho , Sang-Gyun Woo
- Applicant: Chan Hwang , Suk-Joo Lee , Han-Ku Cho , Sang-Gyun Woo
- Applicant Address: KR Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2004-0109830 20041221
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
An optical mask for use with an exposure beam includes a mask substrate adapted to be placed on a traveling path of the exposure beam. A reference pattern is formed on the mask substrate. The reference pattern is adapted to direct the exposure beam to travel in a predetermined reference direction. A comparative pattern is formed on the mask substrate. The comparative pattern is adapted to direct the exposure beam to travel in a direction inclined at a predetermined angle with respect to the reference direction.
Public/Granted literature
- US20060154155A1 Optical masks and methods for measuring aberration of a beam Public/Granted day:2006-07-13
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