Invention Grant
US07670726B2 Optical diffusers, photomasks and their methods of fabrication 失效
光扩散器,光掩模及其制造方法

  • Patent Title: Optical diffusers, photomasks and their methods of fabrication
  • Patent Title (中): 光扩散器,光掩模及其制造方法
  • Application No.: US11489715
    Application Date: 2006-07-20
  • Publication No.: US07670726B2
    Publication Date: 2010-03-02
  • Inventor: Zhijian Lu
  • Applicant: Zhijian Lu
  • Main IPC: G03F1/00
  • IPC: G03F1/00
Optical diffusers, photomasks and their methods of fabrication
Abstract:
A large mask with random apertures may be formed by forming a smaller mask (also called a cell mask) with a random pattern of transmissive apertures which is then repeatedly replicated to create the large mask. The random pattern may be created by perturbing the aperture locations by a small amount or the apertures may be randomly placed within the cell mask provided certain criteria are met. Alternatively, a large mask with a random pattern of transmissive apertures may be formed without using a cell mask. This large mask may be used to fabricate diffusers and other devices that do not suffer from the interference, diffraction and other optical effects common in devices having structures that are non-randomly patterned.
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