Invention Grant
- Patent Title: Illumination compensator for curved surface lithography
- Patent Title (中): 用于曲面光刻的照明补偿器
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Application No.: US11512954Application Date: 2006-08-30
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Publication No.: US07670727B2Publication Date: 2010-03-02
- Inventor: Sivarama K. Kuchibhotla , Kanti Jain , Marc A. Klosner
- Applicant: Sivarama K. Kuchibhotla , Kanti Jain , Marc A. Klosner
- Applicant Address: US NY Hawthorne
- Assignee: Anvik Corporation
- Current Assignee: Anvik Corporation
- Current Assignee Address: US NY Hawthorne
- Agent Carl C. Kling
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03B27/54

Abstract:
A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.
Public/Granted literature
- US20070024830A1 Illumination compensator for curved surface lithography Public/Granted day:2007-02-01
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