A method for repairing a bridge in a photo mask includes disposing a phase shift layer pattern and a light shielding layer pattern over a transparent substrate with the phase shift layer pattern disposed between the transparent substrate and the light shielding layer; forming a resist layer over the entire surface of the photo mask having a defective pattern causing a bridge between neighboring portions of the phase shift layer pattern; exposing the defective pattern by etching the resist layer; and removing the exposed defective pattern.