Invention Grant
- Patent Title: Alkali soluble polymer and positive working photosensitive resin composition using the same
- Patent Title (中): 碱溶性聚合物和正性感光树脂组合物使用
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Application No.: US11979466Application Date: 2007-11-02
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Publication No.: US07670745B2Publication Date: 2010-03-02
- Inventor: Tomohiro Etou , Eiji Watanabe , Ryouta Mineo
- Applicant: Tomohiro Etou , Eiji Watanabe , Ryouta Mineo
- Applicant Address: JP Osaka
- Assignee: Chisso Corporation
- Current Assignee: Chisso Corporation
- Current Assignee Address: JP Osaka
- Agency: Hogan & Hartson LLP
- Priority: JP2006-299052 20061102
- Main IPC: G03F7/022
- IPC: G03F7/022 ; C08F10/14 ; G03F7/004

Abstract:
The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.
Public/Granted literature
- US20080131813A1 Alkali soluble polymer and positive working photosensitive resin composition using the same Public/Granted day:2008-06-05
Information query
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