Invention Grant
US07670750B2 Polymer, resist protective coating material, and patterning process
有权
聚合物，抗蚀剂保护涂层材料和图案化工艺
- Patent Title: Polymer, resist protective coating material, and patterning process
- Patent Title (中): 聚合物，抗蚀剂保护涂层材料和图案化工艺
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Application No.: US11905727Application Date: 2007-10-03
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Publication No.: US07670750B2Publication Date: 2010-03-02
- Inventor: Yuji Harada , Jun Hatakeyama , Koji Hasegawa
- Applicant: Yuji Harada , Jun Hatakeyama , Koji Hasegawa
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-272631 20061004; JP2007-097971 20070404
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; C08F16/24 ; C08F18/20 ; C08F216/12
Abstract:
A resist protective coating material comprises a polymer comprising repeat units having formulae (1a) and (1b) and having a Mw of 1,000-500,000. R1a and R1b are H, F or alkyl or fluoroalkyl, R2a, R2b, R3a and R3b are H or alkyl, or R2a and R2b, and R3a and R3b may bond together to form a ring, 0
Public/Granted literature
- US20080085466A1 Polymer, resist protective coating material, and patterning process Public/Granted day:2008-04-10
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